Since 1984 the ROSE
Company has been manufacturing
photomasks for research, development and production purposes for
European customers. The photomasks are produced and tested with a very
cost-effective method using laser lithography and very powerful software.
The photomasks are produced with a very high degree of precision and
freedom from defects and adapted to fully meet the needs of our
customers, and that with 1 to 3 day delivery periods.
Our photomasks are used in the fields of semiconductor technology,
integrated optics, hybrid and microwave technology, sensor systems,
radio astronomy and micromechanics.
In addition to the photomask technique with glass plates,
also offers customer-specific technology steps to facilitate the
production or development of miniaturized component parts.
Direct writing per customer
data on wafers
or any other kind of substrate.
Three-dimensional exposure of analog
photoresists per customer data
(Gray Scale Process)